Titanium , sputtering target, diam. x thickness 2.00 in. x 0.25 in., 99.995% trace metals basis

Name: Titanium , sputtering target, diam. x thickness 2.00 in. x 0.25 in., 99.995% trace metals basis
Brand: SIGMA-ALDRICH
SKU: 767506-1EA
Price: 204.17 USD

Code: 767506-1EA D2-231

Not available outside of the UK & Ireland.

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturizatio...

Your Price

$204.17 EACH

Discontinued

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Not available outside of the UK & Ireland.

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Packaging

1 ea in rigid mailer

assay	99.995% trace metals basis
autoignition temp.	860 °F
bp	3287 °C (lit.)
density	4.5 g/mL at 25 °C (lit.)
diam. × thickness	2.00 in. × 0.25 in.
form	solid
InChI key	RTAQQCXQSZGOHL-UHFFFAOYSA-N
InChI	1S/Ti
mp	1660 °C (lit.)
Quality Level	100
reaction suitability	core: titanium
resistivity	42.0 µΩ-cm, 20°C
SMILES string	[Ti]